AVIZA Technology, Inc.

RVP-300plus™

The RVP-300plus™ vertical batch furnace delivers superior process results and optimized throughput providing the lowest cost of ownership (CoO) for diffusion, oxidation and LPCVD applications for 300-mm wafers.

Production-proven performance

* Greater than 150 systems in production at major IC manufacturers worldwide

* Aviza’s fourth generation furnace leveraging the design expertise of approximately 2,500 production systems and 40 years of thermal technology experience

Superior process results targeting 90 nm and extendible to 65 nm

* Reduced defectivity delivered through improved process control utilizing a proprietary plenum and unique chamber design

* Improved uniformity achieved by Aviza’s industry-leading Advanced Temperature Control (ATC)

* Reduced thermal budget and optimized work-in-process (WIP) enabled by fast temperature ramping

* Process flexibility as a result of a wide array of films for LPCVD and in-situ doped applications

Low cost of ownership

* Industry’s highest throughput system delivered by

- A unique dual boat design reducing overhead time
- Large capacity wafer FOUP stocker
- In-situ cleaning capability
- Ability to operate in a continuous mode optimizing WIP
* Low consumable usage

* Side-by-side configuration to minimize cleanroom footprint